Charles Tarrio, NIST Gaithersburg
Hosted by Howard Milchberg
Moore’s Law and the Physics of Manufacturing Nanoscale Devices
Over 50 years ago, Gordon Moore postulated that the number of devices in an integrated circuit would double roughly every 1.5-2 years. Lithography is the technology used to keep this up for the last 50 years. Lithography has gone through several iterations, and is currently going through a paradigm shift from deep ultraviolet with a wavelength of 193 nm, to extreme ultraviolet (EUV) with a wavelength of 13.5 nm. The transition to such a short wavelength has presented many scientific and technological challenges. I'll discuss the history of semiconductor lithography and how potential "showstoppers" in the EUV have been overcome.